High Voltage Generation Using Deep Trench Isolated Photodiodes in a Back Side Illuminated Process - IEDM 2018
Filip Kaklin, Jeffrey M. Raynor, Robert K. Henderson
Abstract
We demonstrate passive high voltage generation using photodiodes biased in the photovoltaic region of operation. The photodiodes are integrated in a 90nm back side illuminated (BSI) deep trench isolation (DTI) capable imaging process technology. Four equal area, DTI separated arrays of photodiodes are implemented on a single die and connected using on-chip transmission gates (TG). The TGs control interconnects between the four arrays, connecting them in series or in parallel. A series configuration successfully generates an open-circuit voltage of 1.98V at 1klux. The full array generates 423nW/mm2 at 1klux of white LED illumination in series mode and 425nW/mm2 in parallel mode. Peak conversion efficiency is estimated at 16.1%, at 5.7klux white LED illumination.
Presented at IEDM 2018 in San Francisco, California.